ALD(atomic layer deposition)
format
|
▲ equipment size
800(W)m/mX950(L)m/mX1200(H)m/m |
|
▲ substrate holder substrate : 4" single wafer substrate heat(maximum)℃ :400 PID thermal control |
| ▲ select up with 5 group precursor |
| ▲ vacuum sensor: Pirani gauge |
| ▲ Final vacuum: <5X10-3torr |
| ▲ PLC color control |
| ▲ Full automatic system |
| ▲ Be coating multilayer |